price for Tantalum target, tantalum sputtering target
Precio: usd25/kg
MOQ: 1KG
El tiempo de entrega: 15-20days
Marca: hongtech
Tantalum target, tantalum sputtering target Available grades: Pure grade Ta-W alloy (Ta-2.5W, Ta-10W) Surface condition: Precisely machined / ground, shinny bright surface Roughness Ra 1.6 or better Forms: Circular / planar / tubular According to drawing Specification: As per general industry standa... Ver más
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tantalum sputtering target, tantalum price
Precio: usd25/kg
MOQ: 1KG
El tiempo de entrega: 15-20days
Marca: hongtech
Tantalum target, tantalum sputtering target Available grades: Pure grade Ta-W alloy (Ta-2.5W, Ta-10W) Surface condition: Precisely machined / ground, shinny bright surface Roughness Ra 1.6 or better Forms: Circular / planar / tubular According to drawing Specification: As per general industry standa... Ver más
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Purity 99.95% Tantalum Sputtering Target with Exceptional Thermal Conductivity
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: Our Tantalum vacuum coating target is made from high-quality materials to ensure maximum performance and durability. Whether you are working in research and development or in a full-scale production facility, this Tantalum target has the properties you need for successful sputte... Ver más
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Round Tantalum Sputtering Target Resistivity for RF/DC Sputtering Boasting Extreme Hardness
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: The Tantalum sputtering target is manufactured using advanced technology, resulting in a uniform and dense structure. This ensures that the target has excellent thermal conductivity, with a value of 57.5 W/m·K, and high electrical resistivity of 13.5 μΩ·cm. These properties make... Ver más
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Purity 99.95% Tantalum Sputtering Target with Superior Thermal Conductivity and Hardness
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: Made from high-quality Tantalum metal, this round target boasts exceptional physical properties, including a high electrical resistivity of 13.5 μΩ·cm and a thermal conductivity of 57.5 W/m·K. With a hardness of 6.5 Mohs, this target is highly resistant to wear and tear, ensurin... Ver más
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99.95% Pure Tantalum Sputtering Target with 5425.C Boiling Point
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: The tantalum metal sputtering target features a round shape, allowing for even sputtering and ensuring a uniform coating on your substrate. With a boiling point of 5425°C, this target is ideal for high-temperature sputtering applications, ensuring long-lasting and reliable perfo... Ver más
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Thermal Conductivity Tantalum Sputtering Target 13.5 μΩ·cm RF/DC Magnetron 6.5 Mohs
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: The Tantalum target is made of pure Tantalum metal with a purity of 99.95%, ensuring its excellent performance in sputtering and deposition processes. With a high boiling point of 5425°C, it is suitable for high-temperature applications. The Tantalum target is widely used in var... Ver más
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Electrical Resistivity Tantalum Sputtering Target 6.5 Mohs Hardness 2996.C Melting Point for RF/DC Magnetron
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: Our Tantalum metal sputtering target is available in a variety of sizes to suit your specific deposition requirements. We can customize the target size and shape to ensure a perfect fit for your vacuum coating system. The surface finish of the Tantalum deposition target is Ra≤0.... Ver más
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Purity Round Tantalum Sputtering Target for Precise RF/DC Magnetron Sputtering
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: One of the key features of our Tantalum target is its excellent surface finish. With a surface finish of Ra≤0.8μm, this Tantalum sputtering target is able to provide a uniform and consistent coating on your substrate. This makes it ideal for use in a range of applications, inclu... Ver más
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Purity Round Tantalum Sputtering Target with Superior Thermal Conductivity and 6.5 Mohs Hardness
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: The Tantalum target is designed to be customized to meet the specific needs of each customer. This means that the size and shape of the target can be tailored to fit the requirements of the coating process. The result is a product that is highly efficient and effective in produc... Ver más
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Melting Point Tantalum Sputtering Target Thermal Conductivity For Precision Thin Film Deposition
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: Our Tantalum target features a high thermal conductivity of 57.5 W/m·K, which ensures efficient heat dissipation during the sputtering process. This makes it perfect for use in high-temperature applications. With a melting point of 2996°C, this target is highly resistant to heat... Ver más
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57.5 W/m·K Boiling Point 5425.C Tantalum Sputtering Target for Resistivity Applications
Precio: 11~21
MOQ: 1PC
El tiempo de entrega: 3days
Marca: HONGTECH
Product Description: With an electrical resistivity of 13.5 μΩ·cm, this Tantalum target is ideal for use in various electrical applications. Its high thermal conductivity of 57.5 W/m·K makes it a great choice for use in high-temperature environments. The Tantalum vapor deposition target is designed ... Ver más
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